北京大学学报(医学版) ›› 2022, Vol. 54 ›› Issue (2): 340-345. doi: 10.19723/j.issn.1671-167X.2022.02.023
LIANG Wei,TANG Yao,HUANG Wen-bin,HAN Bing(),LIN Jiu-xiang
摘要:
目的: 探讨常规上磨牙颊侧微种植体支抗技术对安氏Ⅱ类拔牙矫治病例垂直向控制中的作用。方法: 对常规使用两颗上磨牙颊侧微种植体支抗的28例安氏Ⅱ类正畸减数拔牙患者进行治疗前后头颅侧位X线片的头影测量分析比较。结果: 头影测量发现垂直向指标中,下颌平面角 SN-MP平均减小1.40°±1.45°,FMA平均减小1.58°±1.32°;后前面高比(S-Go/N-Me)平均减小 1.42%±1.43%;Y轴角平均减小1.03°±0.99°,面角平均增大1.37° ±1.05°,差异均有统计学意义(P<0.001);上颌磨牙平均压低(0.68±1.40) mm,上前牙平均压低(1.07±1.55) mm,差异均有统计学意义(P<0.05), 提示治疗后有一定的上磨牙压低,产生了一定的下颌平面逆时针前旋,对侧貌改善产生了积极影响。结论: 常规上磨牙颊侧微种植体支抗有一定的垂直向控制能力,可以产生一定的下颌逆时针旋转,可更好地改善安氏Ⅱ类患者的侧貌。
中图分类号:
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